Influence of the Basic Process Parameters on the Ion/Atom Arrival Rate Ratio during Magnetron Sputter Deposition of Thin Carbon Films
- 1 January 1988
- journal article
- research article
- Published by Wiley in Contributions to Plasma Physics
- Vol. 28 (3) , 265-273
- https://doi.org/10.1002/ctpp.2150280309
Abstract
No abstract availableKeywords
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