Laser-Induced Fluorescence Detection of Diatomic Products of Reactive Ion Etching: SiN, SiO, and SiF
- 1 January 1983
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Thermal nitridation of silicon in nitrogen plasmaApplied Physics Letters, 1983
- Laser Optogalvanic Detection of Molecular IonsPhysical Review Letters, 1983
- Measurement of spatially resolved gas-phase plasma temperatures by optical emission and laser-induced fluorescence spectroscopyJournal of Applied Physics, 1983
- Spatially resolved laser-induced fluorescence and optical emission spectroscopy of carbon tetrachloride glow dischargesPlasma Chemistry and Plasma Processing, 1983
- Detection of CF2 radicals in a plasma etching reactor by laser-induced fluorescence spectroscopyApplied Physics Letters, 1982