Optical Constants of CVD-SiC Mirrors Produced by Different Processes from 200 to 1000 eV
- 1 January 1989
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 28 (1R)
- https://doi.org/10.1143/jjap.28.128
Abstract
The optical constants of seven CVD-SiC mirrors produced by different processes have been measured in the soft X-ray region (200-1000 eV) by means of the reflectance method. In spite of the difference in the production process, no dependence of the optical constants on the samples was found. The photon-energy dependence of the optical constants for CVD-SiC is represented in terms of power formulas over a range of 300-1000 eV. It is also found that the rms surface roughness estimated by the reflectance method is always larger than the value measured with a WYKO optical profilometer.Keywords
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