Nanometer-level stitching in raster-scanning electron-beam lithography using spatial-phase locking
- 1 November 2003
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 21 (6) , 2650-2656
- https://doi.org/10.1116/1.1622944
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Optical waveguides with apodized sidewall gratings via spatial-phase-locked electron-beam lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2002
- InhaltPublished by Walter de Gruyter GmbH ,2002
- Image metrology and system controls for scanning beam interference lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2001
- Two-dimensional spatial-phase-locked electron-beam lithography via sparse samplingJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Comparison of fiber Bragg grating dispersion-compensators made with holographic and e-beam written phase masksIEEE Photonics Technology Letters, 1999
- Spatial-phase-locked electron-beam lithography with a delay-locked loopJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Analysis of distortion in interferometric lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Spatial-phase-locked electron-beam lithography: Initial test resultsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993
- Electrodynamics of fast beam blankersJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993
- A multiple exposure strategy for reducing butting errors in a raster-scanned electron-beam exposure systemJournal of Vacuum Science & Technology B, 1988