Boron Redistribution in Silicon by Thermal Oxidation
- 1 September 1962
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 33 (9) , 2911
- https://doi.org/10.1063/1.1702585
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Resistivity of Bulk Silicon and of Diffused Layers in SiliconBell System Technical Journal, 1962
- Impurity Redistribution and Junction Formation in Silicon by Thermal OxidationBell System Technical Journal, 1960