High-rate reactive deposition of indium oxide films on unheated substrate using ozone gas
- 1 September 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 352 (1-2) , 133-137
- https://doi.org/10.1016/s0040-6090(99)00347-8
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
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