In-situ infrared characterization of a chemically oxidized silicon surface dissolving in aqueous hydrofluoric acid
- 1 November 1995
- journal article
- Published by Elsevier in Surface Science
- Vol. 341 (3) , 304-310
- https://doi.org/10.1016/0039-6028(95)00672-9
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
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