Deposition of thick films of oxygen-free high conductivity copper by unbalanced d.c. magnetron sputtering: self-biased and biased conditions
- 10 December 1991
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 49 (1-3) , 298-303
- https://doi.org/10.1016/0257-8972(91)90073-6
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Activation of reactive sputtering by a plasma beam from an unbalanced magnetronVacuum, 1988
- Ion beam bombardment effects during films depositionVacuum, 1988
- Unbalanced dc magnetrons as sources of high ion fluxesJournal of Vacuum Science & Technology A, 1986
- Charged particle fluxes from planar magnetron sputtering sourcesJournal of Vacuum Science & Technology A, 1986