Electron microscopy observations of N2+ -implanted TiN films as diffusion barriers for very-large-scale integration applications
- 1 June 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 140 (1) , 173-176
- https://doi.org/10.1016/0040-6090(86)90172-0
Abstract
No abstract availableKeywords
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