Optical thin films obtained by plasma-induced chemical vapor deposition
- 11 September 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 83 (2) , 253-258
- https://doi.org/10.1016/0040-6090(81)90675-1
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- The application of ion plating to the continuous coating of flexible plastic sheetThin Solid Films, 1981
- Composition and conductivity of fluorine-doped conducting indium oxide films prepared by reactive ion platingThin Solid Films, 1981
- Features of and IN SITU measurements on absorbing TiOx films produced by reactive d.c. magnetron-plasmatron sputteringThin Solid Films, 1980
- Reactive ion plating of metal oxides onto insulating substratesThin Solid Films, 1979
- The effect of the substrate temperature on the optical properties of reactively evaporated silicon oxide filmsThin Solid Films, 1977
- Refractive indices of TiO_2 films produced by reactive evaporation of various titanium–oxygen phasesApplied Optics, 1976