Inelastic electron-electron scattering in silicon (100) inversion layers
- 15 November 1983
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 28 (10) , 5774-5780
- https://doi.org/10.1103/physrevb.28.5774
Abstract
In a weakly disordered system where , we find experimentally that the electron inelastic scattering rate deduced from the magnetoconductance measurement is separable into a term and a term, which agree with the theoretical calculations on the electron-electron interaction in the ordered and diffusive limits. Since the scattering process formulated in the diffusive limit is momentum nonconserving, it affects conductivity directly. This idea is supported by the data published earlier by Cham and Wheeler.
Keywords
This publication has 20 references indexed in Scilit:
- Inelastic scattering time in two-dimensional disordered metalsPhysical Review B, 1983
- Localization and Electron-Electron Interaction Effects in Submicron-Width Inversion LayersPhysical Review Letters, 1982
- Lifetime of a quasiparticle in a two-dimensional electron gasPhysical Review B, 1982
- Magnetoresistance in Si metal-oxide-semiconductor field-effect transitors: Evidence of weak localization and correlationPhysical Review B, 1982
- Negative magnetoresistance in Anderson localization of Si MOS inversion layersSurface Science, 1982
- Logarithmic corrections to two-dimensional transport in silicon inversion layersJournal of Physics C: Solid State Physics, 1981
- Quasiparticle lifetime in disordered two-dimensional metalsPhysical Review B, 1981
- Magnetoconductance and weak localization in silicon inversion layersPhysical Review B, 1981
- Temperature-Dependent Resistivities in Silicon Inversion Layers at Low TemperaturesPhysical Review Letters, 1980
- On the dynamics of electrons in an impure metalThe European Physical Journal A, 1974