The appearance of spatially nonuniform temperature distributions during rapid thermal processing
- 1 January 1991
- journal article
- surfaces and-multilayers
- Published by Springer Nature in Applied Physics A
- Vol. 52 (1) , 52-59
- https://doi.org/10.1007/bf00323684
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Temperature Non-Uniformities During Rapid Thermal Processing Of Patterned WafersPublished by SPIE-Intl Soc Optical Eng ,1990
- Temperature problems with rapid thermal processing for vlsi applicationsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989
- Modulated optical reflectance measurements on amorphous silicon layers and detection of residual defectsApplied Physics A, 1988
- Defects introduced in silicon wafers during rapid isothermal annealing: Thermoelastic and thermoplastic effectsJournal of Applied Physics, 1984