Temperature problems with rapid thermal processing for vlsi applications
- 1 February 1989
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 37-38, 753-759
- https://doi.org/10.1016/0168-583x(89)90292-9
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Effective diffusion time during rapid thermal processingJournal of Applied Physics, 1987
- Uniformity characterization of an RTP systemNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- Thermal and plasma wave depth profiling in siliconApplied Physics Letters, 1985
- Detection of thermal waves through optical reflectanceApplied Physics Letters, 1985