Substrate temperature effect on the stability of hydrogenated amorphous silicon films deposited at high rates
- 1 July 1995
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 78 (1) , 317-320
- https://doi.org/10.1063/1.360678
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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