Electron-energy distribution in silicon under pulsed-laser excitation
- 15 April 1983
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 27 (8) , 5192-5195
- https://doi.org/10.1103/physrevb.27.5192
Abstract
By yield and energy-distribution measurements, we identify two photoemission regimes from silicon under nanosecond laser irradiation. At low fluence and high photon energy, two- and three-quantum processes are the main emission mechanisms; effects of initial and intermediate states are the dominant spectral features. At high fluence and low photon energy, thermoemission prevails and is characterized by a Maxwellian distribution with a temperature different from that of the lattice during the excitation pulse.Keywords
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