Growth of aluminium films by low pressure chemical vapour deposition using tritertiarybutylaluminium
- 31 January 1994
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 135 (1-2) , 285-289
- https://doi.org/10.1016/0022-0248(94)90753-6
Abstract
No abstract availableKeywords
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