Ultraviolet second harmonic generation in radio-frequency sputter-deposited aluminum nitride thin films
- 29 August 1994
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 65 (9) , 1085-1087
- https://doi.org/10.1063/1.112134
Abstract
Optical second harmonic generation in radio-frequency sputter-deposited AlN thin films has been studied for harmonic wavelengths from ultraviolet to near infrared. The effective second-order nonlinearity χ(2)(ω) was determined to have a nonresonant background value of ∼5×10−9 esu for second harmonic wavelengths longer than 400 nm, and it increases dramatically as the second harmonic frequency approaches the bandgap of 6.2 eV. This is likely due to resonance of the second harmonic frequency with the critical point transition associated with the direct bandgap of AlN.Keywords
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