Metastable surface layer of a silicon nitride thin film growing by photo-chemical vapor deposition

This publication has 12 references indexed in Scilit:

• In Situ IR Spectroscopic Study of a-Si:H Films Growing under Photo-Chemical Vapor Deposition Condition
  Japanese Journal of Applied Physics, 1988
• A Polarization Modulation Infrared Reflection Technique Applied to Study of Thin Films on Metal and Semiconductor Surfaces
  Analytical Sciences, 1985
• Investigations of N-H and Si-N Bonding Configurations in Hydrogenated Amorphous Silicon Nitride Films by Infrared Absorption Spectroscopy
  Japanese Journal of Applied Physics, 1985
• Structural and Electrical Properies of Photo-CVD Silicon Nitride Film
  Japanese Journal of Applied Physics, 1984
• IR absorption in glow-discharge-deposited $a-\mathrm{S}\mathrm{i}:(\mathrm{D},\mathrm{O})$ and $a-\mathrm{S}\mathrm{i}:(\mathrm{D},\mathrm{N})$ alloy films
  Physical Review B, 1984
• Infrared reflection-absorption spectroscopy of surface species: a comparison of Fourier transform and dispersion methods
  The Journal of Physical Chemistry, 1984
• Nitrogen-bonding environments in glow-discharge—depositeda−Si:Hfilms
  Physical Review B, 1983
• Multiple adsorbates on copper surfaces in formic acid vapor observed by polarization modulation infrared spectroscopy
  The Journal of Physical Chemistry, 1983
• The effect of index of refraction on the position, shape, and intensity of infrared bands in reflection-absorption spectra*1
  Journal of Catalysis, 1971
• Characterization of Silicon Nitride Films
  Journal of the Electrochemical Society, 1971