Structure and properties of fine-grained electrodeposited nickel
- 1 January 1993
- journal article
- Published by Elsevier in Nanostructured Materials
- Vol. 3 (1-6) , 155-161
- https://doi.org/10.1016/0965-9773(93)90073-k
Abstract
No abstract availableKeywords
This publication has 19 references indexed in Scilit:
- Electronic structure calculations for amorphous Co and NiJournal of Physics: Condensed Matter, 1992
- Free energy of active atoms in grain boundaries of nanocrystalline copper, nickel and palladiumNanostructured Materials, 1992
- Intercrystalline hydrogen transport in nanocrystalline nickelScripta Metallurgica et Materialia, 1991
- Theory of metallic glasses. I. Electronic structuresPhysical Review B, 1990
- Electronic structure near (210) tilt boundaries in nickelPhysical Review B, 1989
- Hall-petch strengthening for the microhardness of twelve nanometer grain diameter electrodeposited nickelScripta Metallurgica, 1986
- Amorphous nickel films getter sputtered at 25°KPhysical Review B, 1978
- Amorphous transition metal filmsIEEE Transactions on Magnetics, 1976
- Curie Points of Electrodeposited Nickel FilmsJournal of the Electrochemical Society, 1975
- Electrical Resistances of Thin Metal Films before and after Artificial Aging by HeatingJournal of Applied Physics, 1957