Amorphous clusters associated with recoil oxygen created in As+ ion-implanted Si/SiO2 systems
- 1 May 1981
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 182-183, 483-488
- https://doi.org/10.1016/0029-554x(81)90719-9
Abstract
No abstract availableKeywords
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- ESR AND OPTICAL ABSORPTION STUDIES OF ION-IMPLANTED SILICONApplied Physics Letters, 1970