The effect of diffusion, reaction order, and developer selectivity on the performance of positive DUV resists
- 31 January 1994
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 23 (1-4) , 315-320
- https://doi.org/10.1016/0167-9317(94)90164-3
Abstract
No abstract availableKeywords
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