Electron energy loss and Auger electron spectroscopy of ultrathin oxide films on silicon obtained in rf oxygen plasma
- 31 December 1982
- journal article
- Published by Elsevier in Applications of Surface Science
- Vol. 10 (2) , 284-301
- https://doi.org/10.1016/0378-5963(82)90148-9
Abstract
No abstract availableKeywords
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