An Ultra-High Emitter Efficiency Transistor with a Low-Temperature Processed Polysilicon Emitter for High-Speed Bipolar Ulsis
- 1 January 1991
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Properties of High Heat-Resistance µc-SiCx:H Emitter Silicon HBT'sJapanese Journal of Applied Physics, 1989
- Superbeta polysilicon emitter transistorsIEEE Electron Device Letters, 1987
- Effect of arsenic segregation on the electrical properties of grain boundaries in polycrystalline siliconJournal of Applied Physics, 1985
- The temperature dependence of ideal gain in double diffused silicon transistorsIEEE Transactions on Electron Devices, 1968