Effect of band structure on Stark shifts in GaAs quantum wells
- 15 September 1989
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 40 (9) , 6420-6423
- https://doi.org/10.1103/physrevb.40.6420
Abstract
We have carried out a pseudopotential calculation of Stark effect on electron states in GaAs- As quantum-well structures. We find that in isolated wells the band-structure effect due to field-induced mixing of bulk Γ and X states is negligible in electric fields (0–5)× V/cm. However, in double-barrier structures normally used to study resonant tunneling the effect of Γ-X mixing drastically reduces the magnitude of critical field, at which quadratic Stark effect and the particle-in-a-box model collapse, to around 2× V/cm. We predict that this critical field is also a sensitive measure of the interface quality.
Keywords
This publication has 16 references indexed in Scilit:
- Exact calculations of quasibound states of an isolated quantum well with uniform electric field: Quantum-well stark resonancePhysical Review B, 1986
- Effect of an electric field on electron and hole wave functions in a multiquantum well structureJournal of Applied Physics, 1986
- Photocurrent spectroscopy of GaAs/As quantum wells in an electric fieldPhysical Review B, 1986
- Resonant tunneling of two-dimensional electrons through a quantum wire: A negative transconductance deviceApplied Physics Letters, 1985
- Electronic structure of an isolated GaAs-GaAlAs quantum well in a strong electric fieldPhysical Review B, 1985
- Band-Edge Electroabsorption in Quantum Well Structures: The Quantum-Confined Stark EffectPhysical Review Letters, 1984
- Tunnelling in quantum-well structuresElectronics Letters, 1984
- Variational calculations on a quantum well in an electric fieldPhysical Review B, 1983
- Transport characteristics of L-point and Γ-point electrons through GaAs–Ga1−xAlxAs–GaAs(111) double heterojunctionsJournal of Vacuum Science & Technology B, 1983
- Summary Abstract: Ion beam control of morphology during the growth of aSiHx thin filmsJournal of Vacuum Science & Technology A, 1983