Correlation between X-Ray Reflectivity and Rutherford Backscattering Spectroscopy for Density Measurement of Thin Films
- 1 January 1993
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 32 (1R)
- https://doi.org/10.1143/jjap.32.164
Abstract
The film density of nickel was examined by means of X-ray reflectivity measurement and Rutherford backscattering spectroscopy (RBS). The Ni thin film was deposited by electron beam evaporation in a high-vacuum system and was annealed to change its density. The density of the as-deposited film was 7.8±0.1 g/cm3. A good correlation between the X-ray reflectivity measurement and RBS was demonstrated.Keywords
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