Effect of early solvent evaporation on the mechanism of the spin‐coating of polymeric solutions
- 1 February 1990
- journal article
- research article
- Published by Wiley in Polymer Engineering & Science
- Vol. 30 (3) , 193-196
- https://doi.org/10.1002/pen.760300309
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- The spin‐coating process mechanism related to polymer solution propertiesPolymer Engineering & Science, 1988
- Transient behavior of spin-coated resist film thickness based on invariance of viscous fluid under similarity transformationIEEE Transactions on Electron Devices, 1986
- Effects of solvent mass transfer on flow of polymer solutions on a flat rotating diskIndustrial & Engineering Chemistry Fundamentals, 1984
- Investigation of the solvent‐evaporation effect on spin coating of thin filmsPolymer Engineering & Science, 1983
- An investigation of spin coating of electron resistsPolymer Engineering & Science, 1979
- Characteristics of resist films produced by spinningJournal of Applied Physics, 1978
- Rheology and Modeling of the Spin Coating ProcessIBM Journal of Research and Development, 1977
- Polymer Coatings. Concepts of Solvent Evaporation PhenomenaProduct R&D, 1970
- Flow of a Viscous Liquid on a Rotating DiskJournal of Applied Physics, 1958
- The flow due to a rotating discMathematical Proceedings of the Cambridge Philosophical Society, 1934