Application of total-reflection X-ray fluorescence spectrometry in material analysis
- 1 January 1990
- journal article
- Published by Springer Nature in Microchimica Acta
- Vol. 101 (1-6) , 305-313
- https://doi.org/10.1007/bf01244183
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Application of total reflection X-ray fluorescence in semiconductor surface analysisSpectrochimica Acta Part B: Atomic Spectroscopy, 1989
- Analysis of thin layers by total-reflection X-ray fluorescence spectrometrySpectrochimica Acta Part B: Atomic Spectroscopy, 1989
- Determination of the critical thickness and the sensitivity for thin-film analysis by total reflection X-ray fluorescence spectrometrySpectrochimica Acta Part B: Atomic Spectroscopy, 1989
- Summary Abstract: Neutral ion beam deposition of high reflectance coatings for use in ring laser gyroscopesJournal of Vacuum Science & Technology A, 1986