A step-and-repeat UV-nanoimprint lithography process using an elementwise patterned stamp
- 31 October 2005
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 82 (2) , 180-188
- https://doi.org/10.1016/j.mee.2005.07.013
Abstract
No abstract availableKeywords
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