Intensity oscillations in reflection high-energy electron diffraction during molecular beam epitaxy of Ni on W(110)
- 21 September 1987
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 51 (12) , 901-903
- https://doi.org/10.1063/1.98795
Abstract
Reflection high-energy electron diffraction intensities during molecular beam epitaxy growth of Ni on W(110) were studied. The damping and polar angle dependence of the observed oscillations are discussed. Intensity oscillations during preparation of a Ni/Cu superlattice are also reported.Keywords
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