Intensity oscillations in reflection high-energy electron diffraction during disilane gas source molecular beam epitaxy

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Abstract
Reflection high-energy electron diffraction (RHEED) intensity oscillations during growth in disilane gas source Si molecular beam epitaxy (MBE) on Si(100) and (111) surfaces were observed under low substrate temperature and high disilane flow rate conditions. As has been observed in solid source Si MBE, these oscillations included periods corresponding to periods for monolayer and bilayer growth. On Si(100) surfaces, growth rate, which was estimated from the periods of the oscillations, was limited by a reaction process whose activation energy was 47 kcal/mol. This rate limitation is thought to stem from hydrogen desorption from monohydride phase on the Si(100). On Si(111) surfaces, oscillations in specular beam intensity were clearly observed. Although clear oscillations in the 7×7 diffraction spots could not be observed because of intensity weakness of the fractional order spots under disilane exposure. At high disilane flow rates, 7×7 diffraction spots almost disappeared and only fundamental spots were observed. The fundamental 1×1 RHEED pattern also indicated monohydride structure on Si(111) surface during the growth.