Important Considerations for SEM Total Dose Testing
- 1 January 1977
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Nuclear Science
- Vol. 24 (6) , 2066-2070
- https://doi.org/10.1109/TNS.1977.4329166
Abstract
The kilovolt electron beam utilized in a scanning electron microscope has been of interest as a tool for total dose screening of semiconductor devices for hardness assurance because of its convenience and because devices can be selectively irradiated directly at the wafer level. A number of factors such as the depth-dose distribution of kilovolt electrons, the dose-rate, uniformity of exposure, and device biasing must be considered when applying this technique. This paper is devoted to these and other aspects of SEM total dose testing.Keywords
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