Xps, Ups, and Hreels Studies of Excimer-Laser-Induced Dissociation of Al2(Ch3) Adsorbed on Si(100) Surfaces
- 1 January 1987
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Time-resolved spectroscopic studies of the ultraviolet-laser photolysis of Al alkyls for film growthJournal of Vacuum Science & Technology B, 1987
- Mechanisms of Al film growth by ultraviolet laser photolysis of trimethylaluminumJournal of Vacuum Science & Technology A, 1986
- Optical and electrical characterizations of laser–chemical-vapor-deposited aluminum oxynitride filmsJournal of Applied Physics, 1986
- Investigation of the surface photochemical basis for metal film nucleation in laser chemical vapor depositionApplied Physics Letters, 1985
- UV-laser photolysis of trimethylaluminum for Al film growthJournal of Applied Physics, 1985
- Surface photochemical phenomena in laser chemical vapor depositionJournal of Vacuum Science & Technology B, 1985
- Infrared matrix isolation spectroscopy of trimethylgallium, trimethylaluminium and triethylaluminiumSpectrochimica Acta Part A: Molecular Spectroscopy, 1984
- Photolysis of Fe(CO)5 adsorbed on GaAs at 77 KJournal of Applied Physics, 1983
- Electron Energy Loss Spectroscopy and Surface VibrationsPublished by Elsevier ,1982
- UV photolysis of van der waals molecular filmsChemical Physics Letters, 1981