Tungsten-Carbon X-ray Multilayered Mirror Prepared by Photo-Chemical Vapor Deposition
- 1 May 1989
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 28 (5R)
- https://doi.org/10.1143/jjap.28.920
Abstract
A tungsten-carbon(W/C) X-ray multilayered mirror was prepared by photoinduced chemical vapor deposition (photo-CVD) using a low-pressure mercury lamp and an argon-fluoride (ArF) excimer laser. The 40% reflectivity of this mirror was measured using a small-angle X-ray diffractometer with Cu-Kα radiation. This reflectivity is lower than the theoretical reflectivity of 80%. From observations of the transmission electron micrograph from this multilayered mirror, it seems that the reduction of the reflectivity was caused by the indistinct interfaces of the diffused films, and by the roughness of the films introduced by partial crystallization of the tungsten films.Keywords
This publication has 10 references indexed in Scilit:
- Structure and physical properties of plasma-grown amorphous hydrogenated carbon filmsThin Solid Films, 1987
- Amorphous carbon films prepared by photo-CVD from acetyleneMaterials Letters, 1986
- Film Thickness Dependence of Silicon Reduced LPCVD Tungsten on Native Oxide ThicknessJournal of the Electrochemical Society, 1986
- Comparison of laser-initiated and thermal chemical vapor deposition of tungsten filmsApplied Physics Letters, 1984
- Low-temperature refractory metal film depositionApplied Physics Letters, 1982
- Laser induced chemical vapor deposition of carbonApplied Physics Letters, 1981
- Long-wave X-ray radiation mirrorsOptics Communications, 1981
- Soft x-ray imaging with toroidal mirrorsApplied Optics, 1978
- Microstructure, growth, resistivity, and stresses in thin tungsten films deposited by rf sputteringJournal of Applied Physics, 1973
- Low-Loss Reflection Coatings Using Absorbing MaterialsApplied Physics Letters, 1972