Influence of plasma conditions on the defect formation mechanism in amorphous hydrogenated silicon
- 1 February 1994
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 75 (3) , 1599-1606
- https://doi.org/10.1063/1.356397
Abstract
No abstract availableThis publication has 29 references indexed in Scilit:
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