Synthesis of copolymers containing 3-hydroxycyclohexyl methacrylate and their application as ArF excimer laser resists
- 1 January 1999
- Vol. 40 (1) , 273-276
- https://doi.org/10.1016/s0032-3861(98)00218-3
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-Layer ResistJournal of Photopolymer Science and Technology, 1996
- Novel ArF Excimer Laser Resists Based on Menthyl Methacrylate Terpolymer.Journal of Photopolymer Science and Technology, 1996
- Photochemistry of triarylsulfonium saltsJournal of the American Chemical Society, 1990
- A new preparation of triarylsulfonium and -selenonium salts via the copper(II)-catalyzed arylation of sulfides and selenides with diaryliodonium saltsThe Journal of Organic Chemistry, 1978
- Estimation of the surface free energy of polymersJournal of Applied Polymer Science, 1969