Emission spectroscopy diagnostics of a magnetron sputter discharge
- 1 March 1989
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 65 (5) , 1846-1851
- https://doi.org/10.1063/1.342918
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- Modeling for rf discharge characteristicsJournal of Applied Physics, 1988
- Langmuir probe characterization of magnetron operationJournal of Vacuum Science & Technology A, 1986
- Steady-state rf magnetron dischargesJournal of Applied Physics, 1985
- Optical techniques in plasma diagnosticsPublished by Walter de Gruyter GmbH ,1984
- Crystallographic etching of GaAs with bromine and chlorine plasmasJournal of Applied Physics, 1983
- Spectroscopic diagnostics of CF4-O2 plasmas during Si and SiO2 etching processesJournal of Applied Physics, 1981
- Optical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle densityJournal of Applied Physics, 1980
- Electrical Properties of RF Sputtering SystemsIBM Journal of Research and Development, 1979
- Optical spectroscopy for diagnostics and process control during glow discharge etching and sputter depositionJournal of Vacuum Science and Technology, 1978
- Determination of the sputtering rate by the fluorescence of sputtered atomsJournal of Applied Physics, 1973