Tunneling and thermal emission of electrons from a distribution of shallow traps in SiO2
- 25 March 1991
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 58 (12) , 1262-1264
- https://doi.org/10.1063/1.104330
Abstract
Charging of existing oxide electron traps is found to be strongly oxide electric field dependent. The transition rate of trapped electrons tunneling into the oxide conduction band increases exponentially with increasing oxide field due to barrier thinning. Electron detrapping via tunnel emission is measured at 77 K using a new isochronal electric-field-stimulated emission technique which gives the energy spectrum of the charged oxide electron traps. The experimental spectrum peaks at 0.9 eV while the measured thermal activation for electron detrapping is about 0.4 eV which are consistent with the Mott ratio of the Jahn–Teller effect for the polar SiO2, 1.9.Keywords
This publication has 12 references indexed in Scilit:
- Oxide field and thickness dependence of trap generation in 9–30 nm dry and dry/wet/dry oxidesJournal of Applied Physics, 1991
- Trap creation in silicon dioxide produced by hot electronsJournal of Applied Physics, 1989
- Observation of threshold oxide electric field for trap generation in oxide films on siliconJournal of Applied Physics, 1988
- Theory of defects in vitreous silicon dioxidePhysical Review B, 1983
- Electron trapping in SiO2 at 295 and 77 °KJournal of Applied Physics, 1979
- Thermal reemission of trapped electrons in SiO2Journal of Applied Physics, 1978
- Tunneling of electrons from Si into thermally grown SiO2Solid-State Electronics, 1977
- A photoluminescence study of acceptor centres in gallium arsenideBritish Journal of Applied Physics, 1967
- Electronic Processes and Excess Currents in Gold-Doped Narrow Silicon JunctionsPhysical Review B, 1961
- An Absolute Theory of Solid-State LuminescenceThe Journal of Chemical Physics, 1951