Effect of electron trapping on IGFET characteristics
- 1 March 1977
- journal article
- Published by Springer Nature in Journal of Electronic Materials
- Vol. 6 (2) , 65-76
- https://doi.org/10.1007/bf02660375
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Threshold instability in IGFET’s due to emission of leakage electrons from silicon substrate into silicon dioxideApplied Physics Letters, 1976
- Hot-carrier instability in IGFET’sApplied Physics Letters, 1975
- Avalanche injection into the oxide in silicon gate-controlled devices—II. Experimental resultsSolid-State Electronics, 1975
- Avalanche injection into the oxide in silicon gate-controlled devices—I theorySolid-State Electronics, 1975
- Silicon nitride trap properties as revealed by charge−centroid measurements on MNOS devicesApplied Physics Letters, 1975
- Avalanche-injected electron currents in SiO2 at high injection densitiesSolid-State Electronics, 1974
- Electron injection into SiO2 from an avalanching p-n junctionJournal of Physics D: Applied Physics, 1973
- Electron gate currents and threshold stability in the n-channel stacked gate MOS tetrodeIEEE Transactions on Electron Devices, 1971
- A New Instability in MOS Transistor Caused by Hot Electron and Hole Injection from Drain Avalanche Plasma into Gate OxideJapanese Journal of Applied Physics, 1970
- AVALANCHE INJECTION CURRENTS AND CHARGING PHENOMENA IN THERMAL SiO2Applied Physics Letters, 1969