Hybrid Films Formed from Hexamethyldisiloxane and SiO by Plasma Process
- 1 August 1991
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 30 (8R) , 1803-1807
- https://doi.org/10.1143/jjap.30.1803
Abstract
No abstract availableKeywords
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- Structure of glow discharge polysilazane thin filmsPolymer, 1976
- Ion Transport Phenomena in Insulating FilmsJournal of Applied Physics, 1965