Pulsed laser deposition of carbon nitride thin films in nitrogen gas ambient
- 1 December 1997
- journal article
- Published by Springer Nature in Journal of Materials Research
- Vol. 12 (12) , 3376-3379
- https://doi.org/10.1557/jmr.1997.0443
Abstract
Carbon nitride thin films have been successfully deposited by ablating a graphite target (99.999%) in nitrogen gas ambient using the second (532 nm) or third (355 nm) harmonic of a Q-switched Nd : YAG laser. Carbon nitride films consisting of approximately 40% nitrogen were obtained at 7.5 × 10−3 Pa of nitrogen gas pressure using the third harmonic laser. The C–N chemical bond in the films was observed by x-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. Ellipsometric studies revealed that the refractive index of the fabricated films decreased with increasing nitrogen concentration.Keywords
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