AUGER ELECTRON SPECTROSCOPY MADE QUANTITATIVE BY ELLIPSOMETRIC CALIBRATION
- 15 March 1971
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 18 (6) , 226-228
- https://doi.org/10.1063/1.1653640
Abstract
Auger electron spectroscopy has been calibrated for various atoms absorbed on clean silicon surfaces by using ellipsometry. The Auger peak heights, measured as the first derivative of the energy distribution, were found to be proportional to surface coverage up to 1.5 monoatomic layer. The advantages of this particular combination of techniques are discussed.Keywords
This publication has 6 references indexed in Scilit:
- Electron-beam assisted adsorption on the Si(111) surfaceSurface Science, 1970
- Ellipsometry in the sub-monolayer regionSurface Science, 1969
- Determination of Surface Structures using LEED and Energy Analysis of Scattered ElectronsJournal of Applied Physics, 1969
- OPTIMIZATION OF AUGER ELECTRON SPECTROSCOPY IN LEED SYSTEMSApplied Physics Letters, 1968
- Analysis of Materials by Electron-Excited Auger ElectronsJournal of Applied Physics, 1968
- Use of LEED Apparatus for the Detection and Identification of Surface ContaminantsJournal of Applied Physics, 1967