Use of secondary molecular ions in Cs‐SIMS elemental analysis

This publication has 4 references indexed in Scilit:

• A new secondary ion mass spectrometry technique for III-V semiconductor compounds using the molecular ions CsM+
  Journal of Applied Physics, 1988
• Quantitative analysis and depth profiling of rare gases in solids by secondary-ion mass spectrometry: Detection of (CsR)+ molecular ions (R=rare gas)
  Journal of Vacuum Science & Technology A, 1988
• Evaluation of a cesium positive ion source for secondary ion mass spectrometry
  Analytical Chemistry, 1977
• High-sensitivity depth profiling of arsenic and phosphorus in silicon by means of SIMS
  Applied Physics Letters, 1976