Submicrometer patterning of cobaltdisilicide layers by local oxidation
- 30 November 1997
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 37-38, 515-521
- https://doi.org/10.1016/s0167-9317(97)00154-8
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Thermal formation of SiO2 films over NiSi, NiSi2 and CoSi2 via silicide decompositionThin Solid Films, 1983
- Oxygen partial-pressure dependence of the oxidation-induced surface stacking faults in (100) n siliconJournal of Applied Physics, 1977