Aerosol formation by rapid nucleation during the preparation of SiO2 thin films from SiCl4 and O2 gases by CVD process
- 31 December 1991
- journal article
- Published by Elsevier in Chemical Engineering Science
- Vol. 46 (7) , 1545-1560
- https://doi.org/10.1016/0009-2509(91)87004-v
Abstract
No abstract availableKeywords
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