The chemistry and transport phenomena of chemical vapor deposition of silicon from SiCl4
- 31 December 1975
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 31, 284-289
- https://doi.org/10.1016/0022-0248(75)90142-6
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Chemical Processes in Vapor Deposition of Silicon: I . Deposition from and Etching byJournal of the Electrochemical Society, 1975
- Mass spectra of silicon containing industrial gasesMaterials Research Bulletin, 1975
- Mass spectrometric and thermodynamics studies of the CVD of some III–V compoundsJournal of Crystal Growth, 1972
- Mass Spectrometric Studies of Vapor Phase Crystal GrowthJournal of the Electrochemical Society, 1971
- The Effects of Gas Pressure and Velocity on Epitaxial Silicon Deposition by the Hydrogen Reduction of Chlorosilanes†International Journal of Electronics, 1967