The Effect of Multiply Charged Ions on the Vickers Hardness of (Ti,Al)N Films

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Abstract
Films deposited by the cathode arc ion plating method contain many droplets, and thus the films are of inferior quality. However, recent investigations show that the number of droplets is reduced by a magnetic field formed on the surface of the target. (Ti,Al)N films deposited by a magnetic field of 200 G have few droplets and good crystallization properties. Under conditions with and without a magnetic field, (Ti,Al)N films are deposited by the conventional method and by the high-discharge voltage method which generates multiply charged ions. Comparison between the Vickers hardness of these films is carried out. In both cases, films deposited by the high-discharge voltage method are harder than those obtained by the conventional method.