On the role of carrier gas in the deposition kinetics of SiO2 films produced by low temperature chemical vapour deposition
- 1 January 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 146 (2) , 183-189
- https://doi.org/10.1016/0040-6090(87)90220-3
Abstract
No abstract availableKeywords
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