Simple model of the lithographic response of “Hatzakis” chemically-amplified resists
- 28 February 1995
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 27 (1-4) , 409-412
- https://doi.org/10.1016/0167-9317(94)00135-h
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- New High‐Resolution and High‐Sensitivity Deep UV, X‐Ray, and Electron‐Beam ResistsJournal of the Electrochemical Society, 1991
- New high resolution and high sensitivity deep UV, x-ray, and electron beam resistsMicroelectronic Engineering, 1990
- Fundamental aspects of electron beam lithography. I. Depth-dose response of polymeric electron beam resistsJournal of Applied Physics, 1973