Thermophoretic effect of particle deposition on a free standing semiconductor wafer in a clean room
- 1 January 1991
- journal article
- Published by Elsevier in Journal of Aerosol Science
- Vol. 22 (1) , 63-72
- https://doi.org/10.1016/0021-8502(91)90093-w
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Experimental Study of Particle Deposition on Semiconductor WafersAerosol Science and Technology, 1990
- Effects of turbulence on heat and mass transfer in stagnation flowsChemical Engineering & Technology, 1989
- Numerical solution of aerosol dynamics for simultaneous convection, diffusion and external forcesJournal of Aerosol Science, 1989
- Determination of deposition velocity onto a wafer for particles in the size range between 0.03 and 0.8 μmJournal of Aerosol Science, 1989
- Particle deposition on wafers: A comparison between two modeling approachesJournal of Aerosol Science, 1988
- Suppression of particle deposition to surfaces by the thermophoretic forceJournal of Aerosol Science, 1987
- Particle Deposition on Semiconductor WafersAerosol Science and Technology, 1987
- Thermophoretic deposition of particles in gas flowing over cold surfacesJournal of Colloid and Interface Science, 1985
- Local and Average Heat Transfer Characteristics for a Disk Situated Perpendicular to a Uniform FlowJournal of Heat Transfer, 1985
- Thermophoresis of particles in a heated boundary layerJournal of Fluid Mechanics, 1980