A new application of soft X-ray spectroscopy to a non-destructive analysis of a film/substrate contact system: Carbonized-layer (ultra-thin-film)/Si(100)
- 31 December 1988
- journal article
- Published by Elsevier in Surface Science
- Vol. 199 (3) , 467-475
- https://doi.org/10.1016/0039-6028(88)90915-6
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- IVA-8 heteroepitaxial growth of cubic silicon carbide on foreign substratesIEEE Transactions on Electron Devices, 1981
- Blue-Emitting Diodes of 6H-SiC Prepared by Chemical Vapor DepositionJapanese Journal of Applied Physics, 1980
- SiSiO2 interface characterization by ESCASurface Science, 1979
- Observation of an intermediate chemical state of silicon in the Si/SiO2 interface by Auger sputter profilingApplied Physics Letters, 1978
- Zur Tiefenverteilung der durch Elektronenstoß angeregten charakteristischen Röntgenstrahlung von Bor, Kohlenstoff, Aluminium und SilberThe European Physical Journal A, 1969